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    EIPBN 2010 - 2010 54th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN)

    View: 4396

    Website eipbn.org | Want to Edit it Edit Freely

    Category EIPBN 2010

    Deadline: January 16, 2010 | Date: June 01, 2010

    Venue/Country: Anchorage, U.S.A

    Updated: 2010-06-04 19:32:22 (GMT+9)

    Call For Papers - CFP

    Abstracts representing high quality original research are desired
    for both poster and oral presentation
    in the following areas:
    Directed Assembly
    Electron Beams
    Emerging Technologies
    Extreme UV Lithography
    Focused Ion Beams
    Mask and Maskless Lithography
    Metrology and Imaging
    Microfluidics
    Modeling
    Nanobiology
    Nanoelectronics
    Nanoimprint
    Nanomechanics and Nanometrology
    Nanophotonics
    Nanostructures and Processing
    Novel Imaging
    Optical Lithography
    Patterned Media and Data Storage
    Resists
    Topics in nanostructures and emerging technologies include:
    Self assembly
    Optical structures
    Carbon nanotubes
    Tip based processing
    Graphene
    ABSTRACT SUBMISSION
    Abstract submission will be available online in early December at this location:
    http://www.eipbn.org/abstract-submission/
    The quality of the abstracts will form the basis for selection of papers for the conference
    and will be peer reviewed according to the following criteria:
    Originality of work
    Specific results achieved and described
    Potential impact and interest to the attendees
    Abstract deadline: January 11, 2010 extended to Jan. 16, 2010.
    Abstracts are limited to one page of text (12 point or larger type)
    and a second, optional page with up to four figures.
    To download an example of a formatted abstract, click here.
    Late submissions may be considered but only if they report truly outstanding results.
    Please prepare abstracts carefully and describe accomplishments specifically.
    Authors will be notified of acceptance by April 12, 2010.
    Earlier notification will be provided to those authors providing an e-mail address.
    MICROGRAPH CONTEST
    On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s).
    Categories and previous winners are described in more detail at the Micrograph Contest page.

    Keywords: Accepted papers list. Acceptance Rate. EI Compendex. Engineering Index. ISTP index. ISI index. Impact Factor.
    Disclaimer: ourGlocal is an open academical resource system, which anyone can edit or update. Usually, journal information updated by us, journal managers or others. So the information is old or wrong now. Specially, impact factor is changing every year. Even it was correct when updated, it may have been changed now. So please go to Thomson Reuters to confirm latest value about Journal impact factor.