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    PHOTOMASK JAPAN 2011 - 18th international symposium on photomasks and NGL masks

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    Website www.photomask-japan.org | Want to Edit it Edit Freely

    Category PHOTOMASK JAPAN 2011

    Deadline: November 30, 2010 | Date: April 13, 2011-April 15, 2011

    Venue/Country: Yokohama, Japan

    Updated: 2010-07-30 13:47:35 (GMT+9)

    Call For Papers - CFP

    Photomask Japan 2011 is the 18th international symposium on photomasks and NGL masks in Japan. The aim of the symposium is to bring together engineers and investigators from Japan, USA, and all over the world in the field of photomasks, NGL masks, and related technologies to discuss recent progress, applications, and future trends. The conference program will feature invited papers, contributed papers, poster sessions, and a rump session with panel discussion. Display opportunities will be provided to mask manufacturing materials, and equipment companies.

    Topics

    Materials of and for Photomasks

    Fabrication Process Steps and Equipments for Photomasks

    (process and equipments for developing, etching, cleaning etc.)

    Photomask Writing Tools and Technologies

    Metrology Tools and Technologies

    Inspection Tools and Technologies

    Repairing Tools and Technologies

    Mask Data Preparations

    EDA and DFM for Photomask

    Photomasks with RET: PSM, Masks with OPC

    Photomask-relating Lithography Technologies

    NGL Masks: EUV, Nano-imprint ML2 etc.

    Mask Strategies and Business Challenges: Cost, Cycle-Time etc.

    Keywords: Accepted papers list. Acceptance Rate. EI Compendex. Engineering Index. ISTP index. ISI index. Impact Factor.
    Disclaimer: ourGlocal is an open academical resource system, which anyone can edit or update. Usually, journal information updated by us, journal managers or others. So the information is old or wrong now. Specially, impact factor is changing every year. Even it was correct when updated, it may have been changed now. So please go to Thomson Reuters to confirm latest value about Journal impact factor.