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    EIPBN 2011 - 2011 International Symposium on Electron, Ion and Photon Beams and Nanofabrication (EIPBN 2011)

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    Website eipbn.org | Want to Edit it Edit Freely

    Category EIPBN 2011

    Deadline: January 17, 2011 | Date: May 31, 2011-June 03, 2011

    Venue/Country: Las Vegas, U.S.A

    Updated: 2011-01-10 11:11:06 (GMT+9)

    Call For Papers - CFP

    EIPBN ? the ‘THREE-BEAMS’ conference ? is recognized as the foremost international meeting dedicated to lithographic sciences and process technologies using election, ion or photon beams, with special emphasis on applications for micro- and nanofabrication techniques. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends.

    Meeting Format

    The conference opens on Tuesday afternoon with a special commercial session featuring vendors of equipment and materials relevant to the conference. There are plenary sessions on each of the following mornings, followed by three parallel sessions. The length of the presentation and discussion is 30 minutes for invited papers and 20 minutes for contributed papers.

    A special feature of the technical program is the poster session that includes both invited and contributed papers. There is only one poster session but posters will be displayed for informal viewing throughout the entire conference.

    Technical Scope

    Abstracts representing high-quality original research are invited in the following areas:

    Micro- and Nanolithography

    . ? Electron-beam lithography

    . ? Ion-beam patterning

    . ? Optical lithography

    . ? Nano-imprint lithography

    . ? Extreme UV lithography

    . ? Masked and maskless lithography

    . ? Directed self-assembly

    . ? Novel or emerging lithographic techniques

    Process Technologies

    . ? Electron or ion beam technologies

    . ? Metrology and imaging

    . ? Resists

    . ? Pattern transfer

    . ? Process simulation and modeling

    . ? Novel beam-based processing

    Applications

    . ? Nanoelectronics

    . ? Patterned media and data storage

    . ? Nanophotonics

    . ? Nanobiology

    . ? Micro- and nano-fluidics

    . ? Novel or emerging applications

    Conference Registration

    We strongly encourage you to register on line by using our website www.eipbn.org . Early registration rates and special student rates are available. The online registration system will be open in the fall of 2010.

    Conference Location

    The conference will be held at the JW Marriott Resort and Spa, close to the Red Rocks Canyon National Conservation Area and only 15 minutes from the world-famous Las Vegas Strip.

    JW Marriott Resort and Spa

    221 Rampart Blvd

    Las Vegas, Nevada 89145 USA

    Phone: 1-702-869-7777

    Fax: 1-702-869-7339

    Toll-free: 1-877-869-8777

    Abstract Submission

    The quality of the abstracts will form the basis for selection of papers for the conference and these will be peer reviewed according to the following criteria:

    . ? originality of the work

    . ? specific results achieved and described

    . ? potential impact and interest to attendees

    Abstracts should be submitted online at

    www.eipbn.org

    Abstracts are limited to one page of text (12 point or larger type) and a second, optional page with up to four figures.

    Abstract deadline: January 10, 2011

    Late submissions may be considered but only if they report truly outstanding results. Please prepare abstracts carefully and describe accomplishments specifically. Authors will be notified of acceptance by email by April 11, 2011.

    Micrograph Contest

    On a less technical level, EIPBN offers the opportunity to immortalize your favorite micrograph(s). Categories and previous winners are described on the conference web site, www.eipbn.org .

    Manuscript Submission

    Manuscripts must be submitted at the time of the conference and will be subjected to a critical peer review before they can be accepted for publication in the Nov/Dec issue of the Journal of Vacuum Science and Technology. Please note that authors are required to pay a publication charge of around $100 per page.

    Conference Chair

    Alan Brodie, Ph.D.

    KLA-Tencor

    One Technology Drive

    M/S 5-3006J, Milpitas CA 95035

    Phone: 408 875 1680

    Fax: 408 875 7325

    e-mail: alan.brodieatkla-tencor.com

    Program Chair

    Prof. Richard Blaikie

    Dept. Electrical and Computer Engineering

    University of Canterbury

    Private Bag 4800, Christchurch 8140

    NEW ZEALAND

    Phone: +64 3 364 3274

    Fax: +64 3 364 2761

    e-mail: richard.blaikieatcanterbury.ac.nz

    Student Support

    Limited funds are available to support student travel to the conference. The Conference Chair must receive a letter requesting support from the student’s advisor by January 10, 2011. PhD student and postdoc resumes will also be collected and distributed to potential employers by email.

    Other Information

    The EIPBN conference is incorporated as a nonprofit organization in the state of New Jersey and is co-sponsored by the American Vacuum Society (www.avs.org), in cooperation with the IEEE Electron Devices Society and Electro-optics Societies and the Optical Society of America (www.osa.org). It is organized by a steering committee that elects two new members each year from those that regularly attend the conference.


    Keywords: Accepted papers list. Acceptance Rate. EI Compendex. Engineering Index. ISTP index. ISI index. Impact Factor.
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