OSEMA 2011 - OSEMA 2011 : International Workshop on Ontology and Semantic web for Manufacturing

Website www.osema.org.ve/ | Edit Freely

Category OSEMA 2011

Deadline: February 28, 2011 | Date: May 28, 2011-June 02, 2011

Venue/Country: HERAKLION, Greece

Updated: 2011-02-07 16:21:45 (GMT+9)

Call For Papers - CFP

Manufacturing (OSEMA 2011)

http://www.osema.org.ve/

at the 8th Extended Semantic Web Conference (ESWC 2011)

http://www.eswc2011.org

May 29th or 30th, Hersonissos, Crete, Greece

SUBMISSION DEADLINE February 25

The necessity of continuous innovation and improvement in productivity

presents the manufacturing industry with huge challenges. Not only is

there a demand for more creative designs, there is also the need to

improve support for streaming designs into production lines. Delivering

products to the market involves the flow of information between several

steps ranging from design to prototyping, manufacturing and

distributing. Interoperability across software supporting these

activities is notoriously limited.

A semantic layer in the manufacturing sector may facilitate scenarios

such as the development of new products considering restrictions and

limitations of the manufacturing facility on the one hand and on the

other hand considering customer needs. Here, the design of new the

product is instantiated into a product ontology. This ontology has

metadata including features related to materials, colors, dimensions,

etc. Such features reflect customer preferences, but imply the necessity

of processes to acquire and manage them. In a second step into this

scenario, the ontology of the manufacturing process can be instantiated

by extracting features from the product ontology, thus enabling e.g. the

automatic inference of manufacturability of the product.

In this vein, ontologies and the Semantic Web facilitate the creation of

such metadata and enable reasoning over product and process restriction.

Although several approaches of this kind have been proposed, none of

them are widely accepted so far, which means that there are still

several issues requiring extensive discussion and consensus in the

community. Therefore, it is necessary to provide a discussion scenario

where theoretical positions, best practices, implementations, proposals

of standards, and frameworks are presented. It will deserve special

interest to discuss how the manufacturing industry can take advantage of

Semantic Web technologies. OSEMA 2011 aims to provide such scenario.

QUESTIONS AND TOPICS OF INTEREST

- How can the Semantic Web support the development of new products?

- Why CAD ontologies? Do we really need them?

- Do we need one enterprise ontology, or a modular enterprise ontology?

- Can OWL be used to represent processes in the manufacturing domain?

- Knowledge management over the manufacturing “Know how”.

- How can the versioning of products be managed? Can ontology help? How?

- How can raw materials be semantically described?

- Can there be an ontological framework for manufacturing so that

designs and production are interoperable?

- Semantic search over the manufacturing information space

- How can tagging techniques be applied within the manufacturing domain?

AUDIENCE

We want to bring together researchers and practitioners active in the

design, development, and application of ontologies and the Semantic Web

in the manufacturing domain, as well as industrial representatives in

Computer Aided Design (CAD), Computer Aided Process Planning (CAPP), and

Computer Aided Manufacturing (CAM) industry who are interested in

integrating the Product Life Cycle management into their software tools.

IMPORTANT DATES

Submission deadline: February 25, 2011

Acceptance notification: April 1, 2011

Camera-ready: April 15, 2011

Workshop date: May 29 or 30, 2011

SUBMISSION AND PROCEEDINGS

Only electronic submissions will be considered. All submissions should

be submitted in pdf format, to

https://www.easychair.org/conferences/?conf=osema2011

Submissions should not exceed 14 pages and should be formatted according

to the LNCS Springer format

(http://www.springer.com/east/home/computer/lncs?SGWID=5-164-7-72376-0).

The workshop proceedings will both be uploaded to CEUR

(http://ceur-ws.org/) and placed on electronic media for distribution at

the conference.

PROGRAM COMMITTEE

1. Aristeidis Matsokis, Laboratory for Computer Aided Design and

Production, Switzerland.

2. Aziz Bouras, University Claude Bernard Lyon II, France.

3. David Baxter, University of Cranfield, England

4. Dong Yang, Shanghai jiao Tong University, China.

5. Grubic Tonci, University of Cranfield, England.

6. John Bateman, University of Bremen, Germany.

7. Jürgen Angele, Ontoprise, Germany.

8. Kristina Shea, Technische Universität München, Germany.

9. Oliver Eck, Department of Computer Science, HTWG Konstanz, Germany.

10. Parisa Ghoudous, University Claude Bernard Lyon I, France.

11. Richard Gil Herrera, University Simón Bolivar. Venezuela.

12. Sylvere Krima, National Institute of Standards and Technology

(NIST), USA.

13. Yuh-Jen Chen, National Kaohsiung First University of Science and

Technology, Taiwan.

ORGANIZING COMMITTEE

* Alexander García Castro, University of Bremen, Germany/University of

Arkansas, USA. Email: alexgarciacgmail.com

* Lutz Schröder, German Research Center for Artificial Intelligence

(DFKI). Email: Lutz.Schroederdfki.de

* Carlos Toro, Vicomtech Research Centre / Donostia-San Sebastían,

Spain. Email: ctorovicomtech.org

* Luis Enrique Ramos García, University of Bremen, Germany. Email:

s_7dns7runi-bremen.de